Growth and Characteristics of Hydrogenated Ga-doped ZnO Thin Films by Pulsed DC Magnetron Sputtering at Room Temperature

JOURNAL OF SYNTHETIC CRYSTALS ›› 2011, Vol. 40 ›› Issue (6): 1404-1409.

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Growth and Characteristics of Hydrogenated Ga-doped ZnO Thin Films by Pulsed DC Magnetron Sputtering at Room Temperature

WANG Fei;CHEN Xin-liang;ZHANG Chi;ZHANG De-kun;WEI Chang-chun;HUANG Qian;ZHANG Xiao-dan;ZHAO Ying;GENG Xin-hua

Online:2011-12-15 Published:2021-01-20

Abstract

CLC Number:

TG356.28

WANG Fei;CHEN Xin-liang;ZHANG Chi;ZHANG De-kun;WEI Chang-chun;HUANG Qian;ZHANG Xiao-dan;ZHAO Ying;GENG Xin-hua. Growth and Characteristics of Hydrogenated Ga-doped ZnO Thin Films by Pulsed DC Magnetron Sputtering at Room Temperature[J]. Journal of Synthetic Crystals, 2011, 40(6): 1404-1409.

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Growth and Characteristics of Hydrogenated Ga-doped ZnO Thin Films by Pulsed DC Magnetron Sputtering at Room Temperature

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