Study on Improving the Compactness of SiO2 Thin Film by PECVD

JOURNAL OF SYNTHETIC CRYSTALS ›› 2013, Vol. 42 ›› Issue (4): 577-581.

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Study on Improving the Compactness of SiO2 Thin Film by PECVD

GUO Wen-tao;TAN Man-qing;JIAO Jian;GUO Xiao-feng;SUN Ning-ning

Online:2013-04-15 Published:2021-01-20

Abstract

CLC Number:

O484.5

GUO Wen-tao;TAN Man-qing;JIAO Jian;GUO Xiao-feng;SUN Ning-ning. Study on Improving the Compactness of SiO2 Thin Film by PECVD[J]. JOURNAL OF SYNTHETIC CRYSTALS, 2013, 42(4): 577-581.

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Study on Improving the Compactness of SiO2 Thin Film by PECVD

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