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JOURNAL OF SYNTHETIC CRYSTALS ›› 2013, Vol. 42 ›› Issue (9): 1750-1756.

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Influence of Argon Flow Rate on Structure and Properties of Hydrogenated Nanocrystalline Silicon Films Prepared by ECR-PECVD

ZHANG Xue-yu;WU Hua;LIU Yao-dong;WU Ai-min   

  • Online:2013-09-15 Published:2021-01-20

CLC Number: