Three-dimensional Numerical Simulation of Chemical Vapor Deposition of Polysilicon

JOURNAL OF SYNTHETIC CRYSTALS ›› 2014, Vol. 43 ›› Issue (3): 569-575.

Previous Articles Next Articles

Three-dimensional Numerical Simulation of Chemical Vapor Deposition of Polysilicon

XIA Xiao-xia;ZHOU Nai-jun;WANG Zhi-qi

Online:2014-03-15 Published:2021-01-20

Abstract

CLC Number:

TK01

XIA Xiao-xia;ZHOU Nai-jun;WANG Zhi-qi. Three-dimensional Numerical Simulation of Chemical Vapor Deposition of Polysilicon[J]. Journal of Synthetic Crystals, 2014, 43(3): 569-575.

Three-dimensional Numerical Simulation of Chemical Vapor Deposition of Polysilicon

PDF (PC)

Knowledge

Abstract

Cite this article

share this article

References

Related Articles 0

Recommended Articles

Metrics

Comments