Uniformity Control for 100 mm 4° SiC Epilayers Based on Orthogonal Experiment

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2014, Vol. 43 ›› Issue (10): 2699-2704.

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Uniformity Control for 100 mm 4° SiC Epilayers Based on Orthogonal Experiment

LI Yun;ZHAO Zhi-fei;LU Dong-sai;ZHU Zhi-ming;LI Zhong-hui

Online:2014-10-15 Published:2021-01-20

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LI Yun;ZHAO Zhi-fei;LU Dong-sai;ZHU Zhi-ming;LI Zhong-hui. Uniformity Control for 100 mm 4° SiC Epilayers Based on Orthogonal Experiment[J]. Journal of Synthetic Crystals, 2014, 43(10): 2699-2704.

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Uniformity Control for 100 mm 4° SiC Epilayers Based on Orthogonal Experiment

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