Properties Analysis of Silicon Film Deposited by PECVD after Annealing

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2014, Vol. 43 ›› Issue (12): 3145-3150.

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Properties Analysis of Silicon Film Deposited by PECVD after Annealing

ZHANG Lin-rui;ZHOU Bing-qing;GAO Yu-wei;ZHANG Long-long;ZHANG Na;LU Xiao-cui

Online:2014-12-15 Published:2021-01-20

Abstract

CLC Number:

TM914

ZHANG Lin-rui;ZHOU Bing-qing;GAO Yu-wei;ZHANG Long-long;ZHANG Na;LU Xiao-cui. Properties Analysis of Silicon Film Deposited by PECVD after Annealing[J]. Journal of Synthetic Crystals, 2014, 43(12): 3145-3150.

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Properties Analysis of Silicon Film Deposited by PECVD after Annealing

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