Influence of Ar Flow Rates on the Microstructure and Optical/Electrical Properties of μc-Si Thin Films Prepared by Magnetron Sputtering

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2015, Vol. 44 ›› Issue (2): 361-367.

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Influence of Ar Flow Rates on the Microstructure and Optical/Electrical Properties of μc-Si Thin Films Prepared by Magnetron Sputtering

QIAO Yong-peng;JIANG Bai-ling

Online:2015-02-15 Published:2021-01-20

Abstract

CLC Number:

TM914.4

QIAO Yong-peng;JIANG Bai-ling. Influence of Ar Flow Rates on the Microstructure and Optical/Electrical Properties of μc-Si Thin Films Prepared by Magnetron Sputtering[J]. Journal of Synthetic Crystals, 2015, 44(2): 361-367.

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Influence of Ar Flow Rates on the Microstructure and Optical/Electrical Properties of μc-Si Thin Films Prepared by Magnetron Sputtering

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