Controlled Growth and Characterization of InN Thin Films Perpared by Magnetron Sputtering

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2018, Vol. 47 ›› Issue (6): 1123-1127.

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Controlled Growth and Characterization of InN Thin Films Perpared by Magnetron Sputtering

WANG Xiao-yang;ZHANG Xiong;YANG Yan-ning;HE Lin;ZHANG Fu-chun;ZHANG Shui-li;LI Xiao-min

Online:2018-06-15 Published:2021-01-20

Abstract

CLC Number:

TN304.2

WANG Xiao-yang;ZHANG Xiong;YANG Yan-ning;HE Lin;ZHANG Fu-chun;ZHANG Shui-li;LI Xiao-min. Controlled Growth and Characterization of InN Thin Films Perpared by Magnetron Sputtering[J]. Journal of Synthetic Crystals, 2018, 47(6): 1123-1127.

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Controlled Growth and Characterization of InN Thin Films Perpared by Magnetron Sputtering

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