直流磁控反应溅射法制备工艺参数对TiO2薄膜光催化性能的影响

人工晶体学报 ›› 2008, Vol. 37 ›› Issue (4): 857-861.

直流磁控反应溅射法制备工艺参数对TiO2薄膜光催化性能的影响

赵琳;QIU Jia-wen;何延春

兰州物理研究所表面工程技术国家级重点实验室,兰州,730000;National Key Laboratory of Surface Engineering,Lanzhou Institute of Physics, Lanzhou 730000, China

出版日期:2008-08-15 发布日期:2021-01-20

Effect of Preparation Parameters on Photocatalytic Activity of TiO2 Films Prepared by DC Reactive Magnetron Sputtering Method

ZHAO Lin;QIU Jia-wen;HE Yan-chun

Online:2008-08-15 Published:2021-01-20

摘要/Abstract

摘要： 采用直流磁控反应溅射法在未加热衬底上沉积TiO2薄膜,以紫外灯为光源进行了薄膜光催化降解亚甲基蓝溶液的实验,研究了沉积工艺参数和后处理退火温度对薄膜光催化性能的影响.结果表明:经过500℃退火、厚度较大的薄膜样品光催化效率较高;膜厚基本相同的样品,沉积时电源功率较小、Ar/O2流量比例较小的薄膜光催化效率较高.

关键词: TiO2薄膜;磁控溅射;光催化;制备工艺参数

Abstract: TiO2 thin films were deposited by direct current (DC) magnetron reactive sputtering without external heating. Photocatalytic activity of the samples was tested by degradation of methylene blue solution under irradiation of a UV lamp. The effect of different preparation parameters on photocatalytic activity was investigated. The results show that the thicker film annealed at 500 ℃ has better photocatalytic activity; Thin films deposited with lower source power and lower Ar/O2 flow ratio display better photocatalytic activity when their thicknesses are similar.

Key words: TiO2 thin films were deposited by direct current (DC) magnetron reactive sputtering without external heating. Photocatalytic activity of the samples was tested by degradation of methylene blue solution under irradiation of a UV lamp. The effect of different preparation parameters on photocatalytic activity was investigated. The results show that the thicker film annealed at 500 ℃ has better photocatalytic activity; Thin films deposited with lower source power and lower Ar/O2 flow ratio display better photocatalytic activity when their thicknesses are similar.

中图分类号:

O484

赵琳;QIU Jia-wen;何延春. 直流磁控反应溅射法制备工艺参数对TiO2薄膜光催化性能的影响[J]. 人工晶体学报, 2008, 37(4): 857-861.

ZHAO Lin;QIU Jia-wen;HE Yan-chun. Effect of Preparation Parameters on Photocatalytic Activity of TiO2 Films Prepared by DC Reactive Magnetron Sputtering Method[J]. Journal of Synthetic Crystals, 2008, 37(4): 857-861.

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