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人工晶体学报 ›› 2025, Vol. 54 ›› Issue (2): 212-218.DOI: 10.16553/j.cnki.issn1000-985x.2024.0259

• 晶体生长、掺杂和缺陷 • 上一篇    下一篇

ε-Ga2O3晶体及其本征缺陷的第一性原理研究

郭满意1,2, 吴佳兴1,2, 杨帆1,2, 王超1,2, 王艳杰1,2, 迟耀丹1,2, 杨小天1,3   

  1. 1.吉林建筑大学寒地建筑综合节能教育部重点实验室,长春 130188;
    2.吉林建筑大学电气与计算机学院,长春 130188;
    3.吉林师范大学,四平 136099
  • 收稿日期:2024-10-28 发布日期:2025-03-04
  • 通信作者: 杨 帆,博士,讲师。E-mail:ctpnxn@163.com
  • 作者简介:郭满意(2000—),男,江苏省人,硕士研究生。E-mail:guomanyi2000@163.com
  • 基金资助:
    吉林省科技发展计划(20200201177JC);吉林省教育厅科学研究项目(JJKH20240362KJ);吉林省科技厅自然科学基金项目(YDZJ202201ZYTS430)

First-Principle Study of ε-Ga2O3 Crystal and Its Intrinsic Defects

GUO Manyi1, 2, WU Jiaxing1, 2, YANG Fan1, 2, WANG Chao1, 2, WANG Yanjie1, 2, CHI Yaodan1, 2, YANG Xiaotian1, 3   

  1. 1. Key Laboratory for Comprehensive Energy Saving of Cold Regions Architecture of Ministry, Jilin Jianzhu University, Changchun 130188, China;
    2. School of Electrical Engineering and Computer Science, Jilin Jianzhu University, Changchun 130188, China;
    3. Jilin Normal University, Siping 136099, China
  • Received:2024-10-28 Published:2025-03-04

摘要: 为了探究本征缺陷导电特性,本文采用第一性原理计算方法对ε-Ga2O3进行计算。首先计算ε-Ga2O3的晶格常数、能带间隙、态密度和能带结构,然后计算含有多种本征缺陷的ε-Ga2O3的态密度和能带结构,分析了它们的电学性质。计算结果表明:ε-Ga2O3为直接带隙半导体,禁带宽度为4.26 eV,光吸收系数峰值在80 nm左右,在450 nm处接近零。在本征缺陷中,不同点位Ga空位缺陷使ε-Ga2O3呈现出p型导电特性,不同点位O空位缺陷没有改变ε-Ga2O3的导电特性;O取代Ga之后,ε-Ga2O3呈现p型导电特性;Ga取代O之后,ε-Ga2O3呈现n型导电特性;引入O填隙的ε-Ga2O3的导电特性没有变化;Ga填隙时ε-Ga2O3呈现n型导电特性。

关键词: ε-Ga2O3晶体, 态密度, 能带结构, 导电特性, 第一性原理, 密度泛函理论

Abstract: In order to investigate the conductive characteristics of the intrinsic defects, the first-principles calculation method was used to calculate ε-Ga2O3 in this paper. Firstly, the lattice constant, band gap, density of states, and band structure of ε-Ga2O3 were calculated. Then, the density of states and band structure of ε-Ga2O3 with intrinsic defects were calculated, and their electrical properties were analyzed. The results show that ε-Ga2O3 is a direct bandgap semiconductor with a bandgap of 4.26 eV, the light absorption peak is around 80 nm and the light absorption coefficient approaches zero at 450 nm. In intrinsic defects, Ga vacancy defects at different sites result in p-type conductivity of ε-Ga2O3, while O vacancy defects at different sites do not change the conductivity of ε-Ga2O3; after O replaced Ga, ε-Ga2O3 exhibits p-type conductivity; after Ga replaced O, ε-Ga2O3 exhibits n-type conductivity; The interstitial O atom don’t change the conductivity of ε-Ga2O3; The ε-Ga2O3 with interstitial Ga atom exhibits n-type conductivity.

Key words: ε-Ga2O3 crystal, density of state, band structure, conductive characteristic, first-principle, density functional theory

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