低压Ar气氛下用PS/OCS/Si (111)叠层热解制备单晶4H-SiC薄膜及层错缺陷抑制机理
王玉霞;李赟;陈征;何海平;王建文;邹优鸣
Growth of Single Crystalline 4H-SiC Film by Pyrogenation of PS/OCS/Si (111) Nappe in Low-pressure Ambient Ar and Mechanism of Suppressing Interfacial Dislocations
WANG Yu-xia;LI Yun;CHEN Zheng;HE Hai-ping;WANG Jian-wen;ZOU You-ming
人工晶体学报
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2006, (2): 337
-341
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