Growth Rate of AlN Thin Films Deposited by Direct Current Dual Targets Magnetron Sputtering Co-deposition

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2006, Vol. 35 ›› Issue (5): 1141-1145.

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Growth Rate of AlN Thin Films Deposited by Direct Current Dual Targets Magnetron Sputtering Co-deposition

MEN Hai-quan;ZHOU Ling-ping;LIU Xin-sheng;LI De-yi;LI Shao-lu;XIAO Han-ning

Online:2006-10-15 Published:2021-01-20

Abstract

CLC Number:

TB43
TB321

MEN Hai-quan;ZHOU Ling-ping;LIU Xin-sheng;LI De-yi;LI Shao-lu;XIAO Han-ning. Growth Rate of AlN Thin Films Deposited by Direct Current Dual Targets Magnetron Sputtering Co-deposition[J]. Journal of Synthetic Crystals, 2006, 35(5): 1141-1145.

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Growth Rate of AlN Thin Films Deposited by Direct Current Dual Targets Magnetron Sputtering Co-deposition

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