Microstructure of Poly-Si Thin Films Prepared by Hot-filament Chemical Vapor Deposition at Low-temperature

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2007, Vol. 36 ›› Issue (6): 1372-1376.

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Microstructure of Poly-Si Thin Films Prepared by Hot-filament Chemical Vapor Deposition at Low-temperature

WANG Li-chun;ZHANG Gui-feng;HOU Xiao-duo;JIANG Xin

Online:2007-12-15 Published:2021-01-20

Abstract

CLC Number:

TB43

WANG Li-chun;ZHANG Gui-feng;HOU Xiao-duo;JIANG Xin. Microstructure of Poly-Si Thin Films Prepared by Hot-filament Chemical Vapor Deposition at Low-temperature[J]. Journal of Synthetic Crystals, 2007, 36(6): 1372-1376.

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Microstructure of Poly-Si Thin Films Prepared by Hot-filament Chemical Vapor Deposition at Low-temperature

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