Abstract: The process of lapping, mechanical polishing and chemical mechanical polishing was used to machine the CdZnTe (211) face, when the surface roughness Ra was 0.94 nm, nano indenter was employed to measure the mechanical properties of CdZnTe (211) face, the experimental results show that the hardness and elastic modulus decrease as the indention load increasing, which is obvious the size effect. When the nanoindenter departs the crystal surface, the adherence effects are obvious. Strong anisotropy of the hardness and elastic modulus is shown on different crystallographic direction.

Key words: The process of lapping, mechanical polishing and chemical mechanical polishing was used to machine the CdZnTe (211) face, when the surface roughness Ra was 0.94 nm, nano indenter was employed to measure the mechanical properties of CdZnTe (211) face, the experimental results show that the hardness and elastic modulus decrease as the indention load increasing, which is obvious the size effect. When the nanoindenter departs the crystal surface, the adherence effects are obvious. Strong anisotropy of the hardness and elastic modulus is shown on different crystallographic direction.