Study on Chemical Mechanical Polishing of Cu Single Crystal Wafer Prepared by Czochralski Method

JOURNAL OF SYNTHETIC CRYSTALS ›› 2011, Vol. 40 ›› Issue (6): 1418-1422.

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Study on Chemical Mechanical Polishing of Cu Single Crystal Wafer Prepared by Czochralski Method

LOU You-xin;WANG Ji-yang;ZHANG Huai-jin;LI Qiang;YAN Qing-feng;MA Zhao-hui;DAI Yuan-jing

Online:2011-12-15 Published:2021-01-20

Abstract

CLC Number:

TG356.28

LOU You-xin;WANG Ji-yang;ZHANG Huai-jin;LI Qiang;YAN Qing-feng;MA Zhao-hui;DAI Yuan-jing. Study on Chemical Mechanical Polishing of Cu Single Crystal Wafer Prepared by Czochralski Method[J]. Journal of Synthetic Crystals, 2011, 40(6): 1418-1422.

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Study on Chemical Mechanical Polishing of Cu Single Crystal Wafer Prepared by Czochralski Method

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