Formation Mechanism of Non-uniformity on Material Removal in Chemical Mechanical Polishing of Hard and Brittle Crystal Substrate

JOURNAL OF SYNTHETIC CRYSTALS ›› 2012, Vol. 41 ›› Issue (4): 1130-1137.

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Formation Mechanism of Non-uniformity on Material Removal in Chemical Mechanical Polishing of Hard and Brittle Crystal Substrate

DU Jia-xi;SU Jian-xiu;WANG Zhan-he;MA Li-je;KANG Ren-ke

Published:2021-01-20

Abstract

CLC Number:

TN305.1

DU Jia-xi;SU Jian-xiu;WANG Zhan-he;MA Li-je;KANG Ren-ke. Formation Mechanism of Non-uniformity on Material Removal in Chemical Mechanical Polishing of Hard and Brittle Crystal Substrate[J]. Journal of Synthetic Crystals, 2012, 41(4): 1130-1137.

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Formation Mechanism of Non-uniformity on Material Removal in Chemical Mechanical Polishing of Hard and Brittle Crystal Substrate

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