Study on Strain Relaxation in Ultrathin Global-strained Si Thin Films

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2013, Vol. 42 ›› Issue (11): 2396-2400.

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Study on Strain Relaxation in Ultrathin Global-strained Si Thin Films

LIU Xu-yan;CUI Ming-yue;HAI Tao;WANG Ai-hua;JIANG Hua-long

Online:2013-11-15 Published:2021-01-20

Abstract

CLC Number:

TN304.2

LIU Xu-yan;CUI Ming-yue;HAI Tao;WANG Ai-hua;JIANG Hua-long. Study on Strain Relaxation in Ultrathin Global-strained Si Thin Films[J]. JOURNAL OF SYNTHETIC CRYSTALS, 2013, 42(11): 2396-2400.

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Study on Strain Relaxation in Ultrathin Global-strained Si Thin Films

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