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JOURNAL OF SYNTHETIC CRYSTALS ›› 2013, Vol. 42 ›› Issue (9): 1857-1863.

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Influence of Working Pressure on Micro-structrure and Photoelectric Properties of the ZAO Thin Films Prepared by RF Magnetron Sputtering

ZHU Hua;WAN Wen-qiong;KUANG Hui-yun;FENG Xiao-wei   

  • Online:2013-09-15 Published:2021-01-20

CLC Number: