Influence of Pressure on Epitaxial Growth in High-showerhead MOCVD Reactor

JOURNAL OF SYNTHETIC CRYSTALS ›› 2015, Vol. 44 ›› Issue (11): 2994-2999.

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Influence of Pressure on Epitaxial Growth in High-showerhead MOCVD Reactor

XU Long-quan;TANG Zi-han;CAO Sheng;ZHANG Jian-li

Online:2015-11-15 Published:2021-01-20

Abstract

CLC Number:

TB47

XU Long-quan;TANG Zi-han;CAO Sheng;ZHANG Jian-li. Influence of Pressure on Epitaxial Growth in High-showerhead MOCVD Reactor[J]. Journal of Synthetic Crystals, 2015, 44(11): 2994-2999.

Influence of Pressure on Epitaxial Growth in High-showerhead MOCVD Reactor

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