Numerical Validation of Gas and Surface Reactions for the Polysilicon Chemical Vapor Deposition Process

JOURNAL OF SYNTHETIC CRYSTALS ›› 2015, Vol. 44 ›› Issue (11): 3083-3089.

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Numerical Validation of Gas and Surface Reactions for the Polysilicon Chemical Vapor Deposition Process

NI Hao-yin;CHEN Cai-xia

Online:2015-11-15 Published:2021-01-20

Abstract

CLC Number:

O734+.1

NI Hao-yin;CHEN Cai-xia. Numerical Validation of Gas and Surface Reactions for the Polysilicon Chemical Vapor Deposition Process[J]. Journal of Synthetic Crystals, 2015, 44(11): 3083-3089.

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Numerical Validation of Gas and Surface Reactions for the Polysilicon Chemical Vapor Deposition Process

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