Effect of Sputtering Pressure on Structure and the Optical Properties of WZO Films Deposited by RF Magnetron Sputtering

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2016, Vol. 45 ›› Issue (4): 1126-1130.

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Effect of Sputtering Pressure on Structure and the Optical Properties of WZO Films Deposited by RF Magnetron Sputtering

GUO Sheng-li;HU Yue-hui;HU Ke-yan;CHEN Yi-chuan;FAN Jian-bin;XU Cheng-zhang;TONG Fan

Online:2016-04-15 Published:2021-01-20

Abstract

CLC Number:

O484.1

GUO Sheng-li;HU Yue-hui;HU Ke-yan;CHEN Yi-chuan;FAN Jian-bin;XU Cheng-zhang;TONG Fan. Effect of Sputtering Pressure on Structure and the Optical Properties of WZO Films Deposited by RF Magnetron Sputtering[J]. Journal of Synthetic Crystals, 2016, 45(4): 1126-1130.

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Effect of Sputtering Pressure on Structure and the Optical Properties of WZO Films Deposited by RF Magnetron Sputtering

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