Comparative Study on Properties of TiO2 Thin Films Prepared by Atomic Layer Deposition and Magnetron Sputtering

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2016, Vol. 45 ›› Issue (6): 1555-1559.

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Comparative Study on Properties of TiO2 Thin Films Prepared by Atomic Layer Deposition and Magnetron Sputtering

CHEN Yan;SHE Qiu-ming;WU Ai-lin;SONG Xin-shan;SONG Zhi-tang;YAO Dong-ning;WU Liang-cai

Online:2016-06-15 Published:2021-01-20

Abstract

CLC Number:

O484.1

CHEN Yan;SHE Qiu-ming;WU Ai-lin;SONG Xin-shan;SONG Zhi-tang;YAO Dong-ning;WU Liang-cai. Comparative Study on Properties of TiO2 Thin Films Prepared by Atomic Layer Deposition and Magnetron Sputtering[J]. Journal of Synthetic Crystals, 2016, 45(6): 1555-1559.

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Comparative Study on Properties of TiO2 Thin Films Prepared by Atomic Layer Deposition and Magnetron Sputtering

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