Abstract: High quality single layer graphene is formed on copper foil with ethnol as carbon source by CVD method then transferred on SiO2/Si substrate. Then the graphene surface is covered with a layer of sibgle layer PS microsphere array by self-assembly method. And it is etched by oxygen plasma, with the etching time increasing, PS microsphere will be gradually etched, and graphene will also be etched in the process. Regular graphene nanodisk arrays will be formed on SiO2/Si substrate after the the removal of impurities of PS microsphere. Field emission scanning electron microscopy ( SEM) , Raman spectroscopy are used to characterization test the graphene nanodisks and its forming process. And it has important reference meaning for preparation of high quality graphene nanoribbons, nanodot, nanodisk.

Key words: High quality single layer graphene is formed on copper foil with ethnol as carbon source by CVD method then transferred on SiO2/Si substrate. Then the graphene surface is covered with a layer of sibgle layer PS microsphere array by self-assembly method. And it is etched by oxygen plasma, with the etching time increasing, PS microsphere will be gradually etched, and graphene will also be etched in the process. Regular graphene nanodisk arrays will be formed on SiO2/Si substrate after the the removal of impurities of PS microsphere. Field emission scanning electron microscopy ( SEM) , Raman spectroscopy are used to characterization test the graphene nanodisks and its forming process. And it has important reference meaning for preparation of high quality graphene nanoribbons, nanodot, nanodisk.