Process Research of Silicon Nitride Thin Film Annealed in Various Atmospheres by Tube Type PECVD

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JOURNAL OF SYNTHETIC CRYSTALS ›› 2018, Vol. 47 ›› Issue (1): 231-234.

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Process Research of Silicon Nitride Thin Film Annealed in Various Atmospheres by Tube Type PECVD

GUO Li;WU Wen-ping;CHEN Li

Online:2018-01-15 Published:2021-01-20

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GUO Li;WU Wen-ping;CHEN Li. Process Research of Silicon Nitride Thin Film Annealed in Various Atmospheres by Tube Type PECVD[J]. JOURNAL OF SYNTHETIC CRYSTALS, 2018, 47(1): 231-234.

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Process Research of Silicon Nitride Thin Film Annealed in Various Atmospheres by Tube Type PECVD

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