Study on the Technology of Mutual Polish of Homogenous Hard Brittle Crystals in Atomized Slurry Applied CMP

JOURNAL OF SYNTHETIC CRYSTALS ›› 2019, Vol. 48 ›› Issue (2): 248-252.

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Study on the Technology of Mutual Polish of Homogenous Hard Brittle Crystals in Atomized Slurry Applied CMP

LI Qing-zhong;LI Qiang-qiang;SUN Su-lei

Online:2019-02-15 Published:2021-01-20

Abstract

CLC Number:

TH161+.14

LI Qing-zhong;LI Qiang-qiang;SUN Su-lei. Study on the Technology of Mutual Polish of Homogenous Hard Brittle Crystals in Atomized Slurry Applied CMP[J]. Journal of Synthetic Crystals, 2019, 48(2): 248-252.

Study on the Technology of Mutual Polish of Homogenous Hard Brittle Crystals in Atomized Slurry Applied CMP

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