Abstract: Hig borosilicate glass films were prepared by RF magnetron sputtering on high borosilicate glass substrate using high borosilicate glass as sputtering target. The properties differences of high borosilicate glass prepared by magnetron sputtering and melting were discussed and the sputtering power on film quality was particularly addressed. The phase structure, composition, deposition rate, light transmittance, nano hardness and Young's modulus of the films were characterized and analyzed by XRD, FT-IR, XPS, SEM, stylus profiler, UV-Vis spectrophotometer, and nano indentation instrument. The results show that the high borosilicate glass thin film prepared in this experiment shows amorphous structure. When the working pressure is 0.6 Pa, the deposition rate increases with the sputtering power. By comparing transmittance of the films prepared using different sputtering powers, it is found that high borosilicate glass films do not obviously influence the transmittance of substrate, with a loss of visible light transmittance being 2% at the sputtering power of 150 W. At different sputtering powers, the nano-hardness and Young's modulus of the films first increase and then decrease with the sputtering powers, these properties reaches the peak values at 120 W, respectively increased by 3% and 3.5% with respect to the base glass substrate.

Key words: high borosilicate glass, magnetron sputtering, thin film, transmittance, mechanical property