Abstract: A continuous and pure crystalline film of β-C3N4 with {221} textured characteristic has been grown using an ECR CVD (electron cyclotron resonance plasma enhanced chemical vapor deposition) process. The morphology of the deposited films was observed using SEM (scanning electron microscopy). Chemical compositions and chemical states of elements in the deposited films were analyzed using XPS (X-ray photoelectron spectroscopy), XRD (X-ray diffraction) and Raman scattering were used to characterize the film structure.

Key words: A continuous and pure crystalline film of β-C3N4 with {221} textured characteristic has been grown using an ECR CVD (electron cyclotron resonance plasma enhanced chemical vapor deposition) process. The morphology of the deposited films was observed using SEM (scanning electron microscopy). Chemical compositions and chemical states of elements in the deposited films were analyzed using XPS (X-ray photoelectron spectroscopy), XRD (X-ray diffraction) and Raman scattering were used to characterize the film structure.