Abstract: Boron doped diamond films on Ti substrates were prepared by microwave plasma chemical vapor deposition(MPCVD) in the reactant gas of H2-CH4-B2H6. Resistivity of the undoped and doped films was measured by the 4-probe measurement method, which reduced from 1×1012 -5×10-3 Ω*cm with the increasing of the atomic ratio B/C from 0 to 5×10-3. Scanning electron microscope and Raman spectroscopy were used to characterize the morphology and microstructure of these films. Electrochemical behavior of BDD electrode was tested by Cyclic-voltammetry. p-nitrophenol, a common pollutant, was electrolyzed by using the BDD electrodes, as well as the PbO2, Sn-Sb and PbO2-Er electrodes as anode. The comparison of the removal of the total organic carbon using those electrodes shown above demonstrated that the Ti/BDD electrode producing a TOC decrease of approximately 100; has the best electrochemical property.