Abstract: ZnO/Cu/ZnO multilayer films were prepared by RF sputtering of ZnO and DC sputtering of Cu target at different substrate temperature. The properties of ZnO/Cu/ZnO films characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), double-beam UV-spectrophotometer and four-point probe method. The results showed that the ZnO layers have a preferred c-axis orientation, as the substrate temperature increasing, the crystallinity of ZnO layers increases, the crystallinity of Cu layers increases initially and then decreases, the root mean square roughness increases, the transmittance increases. The max transmittance is near 90; when the substrate temperature reaches to 300 ℃. The sheet resistance increases with increase of substrate temperature, the minimum resistance is 12.4 Ω/□.

Key words: ZnO/Cu/ZnO multilayer films were prepared by RF sputtering of ZnO and DC sputtering of Cu target at different substrate temperature. The properties of ZnO/Cu/ZnO films characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), double-beam UV-spectrophotometer and four-point probe method. The results showed that the ZnO layers have a preferred c-axis orientation, as the substrate temperature increasing, the crystallinity of ZnO layers increases, the crystallinity of Cu layers increases initially and then decreases, the root mean square roughness increases, the transmittance increases. The max transmittance is near 90; when the substrate temperature reaches to 300 ℃. The sheet resistance increases with increase of substrate temperature, the minimum resistance is 12.4 Ω/□.