Magnetic Field Design and Simulation of Cylindrical Magnetron Sputtering Target

Abstract

Abstract: The cylindrical magnetron sputtering cathode target, playing a key role in many application fields, could be controbally tuned by structure and magnetic field distribution. Otherwise, up to now, it is inadequate for the structure research of this type of target. Herein, this structure was calculated by AC/DC interface in COMSOL Multiphysics, including constructing 3D model, dividing mesh and results analysis. In addition, the distribution law of magnetic field on target surface is determined by the structural parameters of magnets, the shape of the magnetic yoke, and the structural arrangement in the target. The results show that the magnetic filed of the target surface is directly affected by the cross-sectional area of the magnetic ring, the thickness and height of the magnetic yoke. Also, the uniform area of the magnetic field on the target surface is determined by the magnetic yoke gap in the magnetic circuit structure and the shape of the extension arm of the magnetic yoke. Herein, a novel cylindrical magnetron sputtering target is presented, which has a uniformly distributed magnetic field on the target surface and the magnetic induction intensity is 20 mT to 35 mT. In addition, the uniform magnetic field area on the parallel target surface reaches about 35% to 40%. This work pave a way to deeply apply cylindrical magnetron sputtering cathode target into coating process.

Key words: magnetron sputtering, magnetic field distribution, column target, finite element analysis, COMSOL, structural parameter, vacuum coating, design and simulation

CLC Number:

TB43

YANG Xinlei, MI Qian, GONG Lirong, ZHOU Fenglin. Magnetic Field Design and Simulation of Cylindrical Magnetron Sputtering Target[J]. Journal of Synthetic Crystals, 2021, 50(9): 1765-1773.

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