Effect of Substrate Temperature on Microstructure and Optical Properties of ZnO Thin Films
CHEN Xinghui, TANG Yinghui, WANG Jiaqiang, CHAI Hanyang, WEI Xinqi, CHEN Guangwei
2021, 50(9):
1681-1687.
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Substrate temperature is a very important process index in the preparation of zinc oxide thin films by magnetron sputtering. Exploring the effect of substrate temperature on the microstructure and optical properties of zinc oxide thin films is of great significance for the preparation of environmental protection high quality zinc oxide ultraviolet shielding materials. A zinc oxide ceramic target with a mass fraction of 99.99% was served as a sputtering source, and a zinc oxide ultraviolet shielding film was deposited on a quartz substrate by radio frequency magnetron sputtering technology. And the effects of different substrate temperatures on the microstructure and optical properties of ZnO films were characterized and studied by X-ray diffractometer, film thickness gauge, ultraviolet-visible spectrophotometer, and fluorescence spectrophotometer instruments. The experimental results show that the as-prepared films are all hexagonal wurtzite structures, which exhibit the features of preferential growth along the (002) crystal plane, and their lattice constant, grain size, transmittance, optical energy gap, visible fluorescence, and crystal quality are closely related to the substrate temperature. When the experimental conditions satisfy that the substrate temperature is 250 ℃, the sputtering power is 160 W, the argon pressure is 0.5 Pa, the argon flow rate is 8.3 mL/min, and the deposition time is 60 min, the as-prepared zinc oxide film sample exhibits the best orientation, the largest crystal grain size, and a dense film structure, as well as good optical properties and crystal quality.