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人工晶体学报 ›› 2004, Vol. 33 ›› Issue (4): 667-669.

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直流反应磁控溅射法制备二氧化钛薄膜的光响应

张利伟;张兵临;姚宁;樊志琴;杨仕娥;鲁占灵   

  1. 郑州大学物理工程学院材料物理重点实验室,郑州,450052
  • 出版日期:2004-08-15 发布日期:2021-01-20

Photoresponse of TiO2 Thin Films Deposited by DC Reactive Magnetron Sputtering

  • Online:2004-08-15 Published:2021-01-20

摘要: 采用直流反应磁控溅射的方法在镀有ITO的导电玻璃衬底上沉积了二氧化钛薄膜,分别用拉曼光谱和吸收光谱研究了薄膜的结构,通过光电流研究了二氧化钛薄膜的紫外光响应.在100s的时间内光电流能达到最大值的96;,当停止紫外光照射时,光电流在200s的时间内能恢复到暗电流,二氧化钛薄膜对紫外光的灵敏性和稳定的光响应表明二氧化钛薄膜有可能成为一种新的紫外光探测器材料.

关键词: 直流反应磁控溅射;二氧化钛薄膜;光响应;光电流

Abstract: TiO2 thin films were prepared by DC reactive magnetron sputtering on ITO surface which deposited on glass substrates. The structure of TiO2 thin films was studied by Raman spectrum and the absorption spectra. The photoresponses of TiO2 thin films were investigated in virtue of photocurrent. The photoresponse time is less than 100s when photocurrent reaches 96; of the maximum and the photocurrent decays to dark current within 200s.The sensitivity and stability of the photoresponse indicate that it is possible for TiO2 thin films to be a new UV detector material.

Key words: TiO2 thin films were prepared by DC reactive magnetron sputtering on ITO surface which deposited on glass substrates. The structure of TiO2 thin films was studied by Raman spectrum and the absorption spectra. The photoresponses of TiO2 thin films were investigated in virtue of photocurrent. The photoresponse time is less than 100s when photocurrent reaches 96; of the maximum and the photocurrent decays to dark current within 200s.The sensitivity and stability of the photoresponse indicate that it is possible for TiO2 thin films to be a new UV detector material.

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