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人工晶体学报 ›› 2017, Vol. 46 ›› Issue (5): 890-896.

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微/纳米CVD金刚石涂层沉积工艺参数优化

许晨阳;解亚娟;邓福铭;陈立;雷青   

  1. 中国矿业大学(北京)超硬刀具材料研究所,北京,100083;中国矿业大学(北京)超硬刀具材料研究所,北京 100083;信利光电股份有限公司,汕尾 516600
  • 出版日期:2017-05-15 发布日期:2021-01-20
  • 基金资助:
    国家自然科学基金(51172278);北京市自然科学基金(15L00025);北京教委科技成果转化项目(2010-583)

Process Parameters Optimization of Micro/Nano-crystalline CVD Diamond Coatings

XU Chen-yang;XIE Ya-juan;DENG Fu-ming;CHEN Li;LEI Qing   

  • Online:2017-05-15 Published:2021-01-20

摘要: 通过正交实验设计工艺参数,利用热丝化学气相沉积法(HFCVD)制备金刚石涂层,采用扫描电镜、洛氏硬度计、X射线衍射仪等对金刚石涂层进行性能表征,同时进行切削试验,从而确定微米层和纳米层最佳的碳源浓度、沉积气压、热丝与基体间距.结果表明:最优微米金刚石涂层沉积工艺参数为碳源浓度2;,沉积气压3 kPa,热丝/基体间距5 mm.最优纳米金刚石涂层沉积工艺参数为碳源浓度5;,沉积气压5 kPa,热丝/基体间距8 mm.

关键词: 碳源浓度;沉积气压;热丝与基体间距

Abstract: The process parameters were designed by orthogonal experiment.Diamond coatings were synthesized by Hot Filament Chemical Vapor Deposition (HFCVD) and the scanning electron microscopy (SEM), rockwell hardness tester, X-ray diffraction (XRD) were used to test the coating properties and cutting tests to determine the optimum carbon source concentration, deposition pressure and hot wire/substrate spacing for the micro and nano layers.The results show that the optimum micro-diamond coating deposition process parameters are carbon source concentration of 2;, deposition pressure 3 kPa, hot wire/substrate spacing 5 mm.The optimum nano-diamond coating deposition process parameters are Carbon source concentration of 5;, deposition pressure 5 kPa, hot wire/substrate spacing 8 mm.

Key words: The process parameters were designed by orthogonal experiment.Diamond coatings were synthesized by Hot Filament Chemical Vapor Deposition (HFCVD) and the scanning electron microscopy (SEM), rockwell hardness tester, X-ray diffraction (XRD) were used to test the coating properties and cutting tests to determine the optimum carbon source concentration, deposition pressure and hot wire/substrate spacing for the micro and nano layers.The results show that the optimum micro-diamond coating deposition process parameters are carbon source concentration of 2;, deposition pressure 3 kPa, hot wire/substrate spacing 5 mm.The optimum nano-diamond coating deposition process parameters are Carbon source concentration of 5;, deposition pressure 5 kPa, hot wire/substrate spacing 8 mm.

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