掺硼金刚石膜研究进展及应用

摘要/Abstract

摘要： 掺硼金刚石在原有金刚石高硬度、高稳定性、良好的生物相容性等优良性能的基础上,具有半导体甚至低温超导特性,以及宽的电化学势窗、低背景电流等电化学优势。目前,掺硼金刚石膜被公认为是极佳的电化学电极材料,大量研究工作集中在硼的掺杂方式、掺硼金刚石膜微观形貌控制、掺硼金刚石膜表面修饰等方面,以优化掺硼金刚石膜的性能,拓展其应用空间。本文基于对掺硼金刚石结构的认识,综述了其电学及电化学性能研究进展,阐述了其主要制备方法。并分析了掺硼金刚石膜作为电极在消毒杀菌、废水处理、超级电容器、生物传感器等领域的应用现状及前景。

关键词: 掺硼金刚石, 电极, 电化学氧化, 超级电容器, 生物传感器

Abstract: On the basis of maintaining the excellent properties of diamond, such as high hardness, high stability and good biocompatibility, boron-doped diamond has the characteristics of semiconductor and even low temperature superconductivity, as well as wide electrochemical potential window and low background current. At present, boron-doped diamond film is recognized as an excellent electrochemical electrode material. In order to optimize the performance of boron doped diamond film and expand its application space, a lot of researches focus on boron doping, micro-morphology control of boron-doped diamond film, and surface modification of boron-doped diamond film, and so on. Based on the understanding of the structure of boron-doped diamond, this paper reviews the research progress of its electrical and electrochemical properties, and expounds its main preparation methods. This paper also analyze the application status and prospect of boron-doped diamond film as electrodes in sterilization, wastewater treatment, supercapacitors, biosensors and other fields.

Key words: boron-doped diamond, electrode, electrochemical oxidation, supercapacitor, biosensor

中图分类号:

TB43

郑彧, 张怡, 童亚琦, 玄真武. 掺硼金刚石膜研究进展及应用[J]. 人工晶体学报, 2021, 50(6): 1138-1148.

ZHENG Yu, ZHANG Yi, TONG Yaqi, XUAN Zhenwu. Research Progress and Application of Boron-Doped Diamond Film[J]. JOURNAL OF SYNTHETIC CRYSTALS, 2021, 50(6): 1138-1148.

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