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人工晶体学报 ›› 2021, Vol. 50 ›› Issue (8): 1534-1540.

• 研究论文 • 上一篇    下一篇

以溶液法PEDOT∶PSS作为空穴传输层的免光刻背接触硅太阳电池

孙纵横, 沈荣宗, 石艳斌, 周玉荣, 周玉琴, 刘丰珍   

  1. 中国科学院大学材料与光电研究中心&材料科学与光电技术学院,北京 100049
  • 收稿日期:2021-05-06 出版日期:2021-08-15 发布日期:2021-09-14
  • 通讯作者: 周玉荣,博士,副教授。E-mail:zhouyurong@ucas.ac.cn刘丰珍,博士,教授。E-mail:liufz@ucas.ac.cn
  • 作者简介:孙纵横(1997—),男,江西省人,硕士研究生。E-mail:sunzongheng18@mails.ucas.ac.cn
  • 基金资助:
    国家自然科学基金青年科学基金(61604153)

Lithography-Free Interdigitated Back Contact Silicon Solar Cells with Solution-Processed PEDOT∶PSS as the Efficient Hole Transport Layer

SUN Zongheng, SHEN Rongzong, SHI Yanbin, ZHOU Yurong, ZHOU Yuqin, LIU Fengzhen   

  1. College of Materials Science and Opto-Electronic Technology & Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • Received:2021-05-06 Online:2021-08-15 Published:2021-09-14

摘要: 对PEDOT∶PSS(聚(3,4亚乙二氧基噻吩)-聚(苯乙烯磺酸))薄膜与Mg、Al和Ag三种金属接触后的I-V特性曲线进行了测试分析,发现Mg和Al与PEDOT∶PSS薄膜接触后呈现高电阻特性,可以起到绝缘隔离层的作用。在此基础上,以PEDOT∶PSS作为空穴传输层,以LiF作为电子传输层,以PEDOT∶PSS与Mg/Al的接触作为隔离层,不采用光刻工艺,设计制备了只需一次掩膜工艺的背接触太阳电池。通过在PEDOT∶PSS上采用热丝氧化升华技术制备MoOx层,通过优化LiF薄膜的厚度,在抛光硅片上初步实现了开路电压最高为592 mV和效率最高为10.13%的背接触太阳电池。采用金属辅助腐蚀制备硅纳米线陷光结构改善前表面陷光效果,得到了开路电压为587 mV,短路电流密度为35.57 mA/cm2,填充因子为69.97%,效率为14.61%的背接触太阳电池。

关键词: 背接触硅基太阳电池, 免光刻工艺, 掩膜技术, PEDOT∶PSS空穴传输层, 溶液法

Abstract: The I-V characteristics of the PEDOT∶PSS/metal hetero-contacts with different metals of Mg, Al and Ag were investigated. It's found that the resistivity of the Mg(Al)/PEDOT∶PSS contact is considerably high, which may play the role of an insulated layer. Based on this phenomenon, a simple lithography-free interdigitated back contact silicon solar cell using PEDOT∶PSS as the hole transport layer and LiF as the electron transport layer was designed and fabricated. During the fabrication of the solar cells, shadow mask was used only once attributed to the insulating effect of the Mg/Al/PEDOT∶PSS contact. Then a MoOx layer grown by hot wire oxidation-sublimation deposition technique was overlaid on PEDOT∶PSS and a LiF thin film with appropriate thickness was thermal evaporated into the interface between Si and Mg/Al to improve the ability of carriers collection of the device. And the interdigitated back contact silicon solar cells with a highest VOC of 592 mV and a best efficiency of 10.13% are achieved. Using metal-assisted chemical etching to prepare silicon nanowire structure which improves the effect of front surface light trapping, an interdigitated back contact solar cell with a VOC of 587 mV, a JSC of 35.57 mA/cm2, a FF of 69.97%, and an efficiency of 14.61% is fabricated.

Key words: interdigitated back contact silicon solar cell, lithography-free process, shadow mask technology, PEDOT∶PSS hole transport layer, solution method

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