基于摩擦磨损的KDP晶体固结磨料抛光垫优化

摘要/Abstract

摘要： 本文通过固结磨料球与KDP晶体对磨的单因素试验探究固结磨料球中反应物种类、磨粒浓度、反应物浓度、基体硬度对摩擦系数、磨痕截面积和磨痕处粗糙度的影响,试验结果表明:KHCO₃固结磨料球对磨后磨痕对称性好,磨痕处的粗糙度值低;磨痕截面积随磨粒和反应物浓度的增加而增大,随基体硬度的增大而降低;磨痕处粗糙度随磨粒和反应物浓度的增加先降低后上升,随基体硬度的增大先上升后降低;摩擦系数受磨粒和反应物浓度影响不明显,随基体硬度的增大而降低。选择KHCO₃作为反应物,Ⅰ基体,磨粒浓度为基体质量的100%,反应物浓度为15%制备固结磨料球与KDP晶体对磨后的磨痕轮廓对称度好且磨痕处粗糙度值低,以该组分制备固结磨料垫干式抛光KDP晶体,可实现晶体表面粗糙度Sa值为18.50 nm,材料去除率为130 nm/min的高效精密加工。

关键词: KDP晶体, 固结磨料垫, 晶体加工, 干式抛光, 摩擦磨损, 反应物

Abstract: In this paper, the effects of reactant type, abrasive concentration, reactant concentration and matrix hardness on friction coefficient, cross-sectional area of wear mark and roughness at wear mark were studied by single factor experiments of fixed abrasive ball grinding with KDP crystal. The test results show that: KHCO₃ fixed abrasive ball has good symmetry of the wear scar, small roughness value at the wear scar, and small damage depth of KDP crystal. The cross-sectional area of wear scar increases with the increase of the concentration of abrasive and reactants, and decreases with the increase of the hardness of the matrix. The roughness at the wear scar decreases and then increases with the increase of the concentration of abrasive and reactant, and first increases and then decreases with the increase of the hardness of the matrix. The friction coefficient is not significantly influenced by the concentration of abrasive and reactants, but decreases with the increase of the hardness of the matrix. The abrasive scar contour symmetry is good and the roughness value at the wear scar is low when the composition of fixed abrasive ball is KHCO₃ as the reactant, Ⅰ matrix, the abrasive concentration is 100% of the matrix mass, and the reactant concentration is 15%. The fixed abrasive pad was prepared from the components above, and the KDP crystal was polished by the pad. High efficiency and high precision machining can be achieved with surface roughness Sa of 18.5 nm and material removal rate of 130 nm/min.

Key words: KDP crystal, fixed abrasive pad, crystal machining, dry polishing, friction and wear, reactant

中图分类号:

熊光辉, 李军, 李凯旋, 吴成, 于宁斌, 高秀娟. 基于摩擦磨损的KDP晶体固结磨料抛光垫优化[J]. 人工晶体学报, 2022, 51(2): 271-281.

XIONG Guanghui, LI Jun, LI Kaixuan, WU Cheng, YU Ningbin, GAO Xiujuan. Optimization of Fixed Abrasive Polishing Pad for KDP Crystal Based on Friction and Wear[J]. JOURNAL OF SYNTHETIC CRYSTALS, 2022, 51(2): 271-281.

参考文献

[1] DONG H, WANG L L, GAO W, et al. KDP aqueous solution-in-oil microemulsion for ultra-precision chemical-mechanical polishing of KDP crystal[J]. Materials, 2017, 10(3): 271.
[2] WANG C, SHI W, ZHANG Z Z, et al. Heterogeneous growth of KDP/KT crystal[J]. Chinese Physics B, 2017, 26(10): 104209.
[3] 黄金库,李军,黄建东,等.不同粒径金刚石固结磨料抛光硫化锌晶体研究[J].机械制造与自动化,2017,46(2):13-15.
HUANG J K, LI J, HUANG J D, et al. Research on diamond fixed polishing abrasive size for ZnS crystal[J]. Machine Building & Automation, 2017, 46(2): 13-15(in Chinese).
[4] HUANG S G, LU J, LIN Y C, et al. Study on the enhancement of sol-gel properties by binary compounding technology for dry polishing hard and brittle materials[J]. Journal of Sol-Gel Science and Technology, 2020, 96(2): 314-326.
[5] 马驰,刘长伟,史颖,等.聚氨酯电子抛光垫材料的组成及形态结构研究[J].聚氨酯工业,2019,34(5):9-12.
MA C, LIU C W, SHI Y, et al. Study on composition and morphological structure of polyurethane-based electronic polishing pads[J]. Polyurethane Industry, 2019, 34(5): 9-12(in Chinese).
[6] 王光灵,刘卫丽,刘宇翔,等.化学机械抛光工艺参数对氧化锆陶瓷抛光速率的影响[J].表面技术,2018,47(9):266-271.
WANG G L, LIU W L, LIU Y X, et al. Effects of chemical-mechanical polishing parameters on material removal rate of zirconia ceramic[J]. Surface Technology, 2018, 47(9): 266-271(in Chinese).
[7] PONTE D C, MEYER D M L. Energy dissipation and constitutive modeling for a mechanistic description of pad scratching in chemical-mechanical planarization[J]. Journal of Materials Science: Materials in Electronics, 2016, 27(2): 1745-1757.
[8] LUO Y J, LIU M, WANG W, et al. Novel CMP pads by special structural design[C]//2018 China Semiconductor Technology International Conference (CSTIC). March 11-12, 2018, Shanghai, China. IEEE, 2018: 1-3.
[9] ZHENG F Z, ZHU N N, ZHU Y W, et al. Self-conditioning performance of hydrophilic fixed abrasive pad[J]. The International Journal of Advanced Manufacturing Technology, 2017, 90(5/6/7/8): 2217-2222.
[10] 吕冰海,董晨晨,邓乾发,等.可溶填充剂对孔隙自生成超硬磨料磨具孔隙生成的影响[J].机械工程学报,2014,50(15):172-179.
LÜ B H, DONG C C, DENG Q F, et al. Influence of soluble filler on pores self-generation superabrasive tool[J]. Journal of Mechanical Engineering, 2014, 50(15): 172-179(in Chinese).
[11] 沈功明,顾群飞,王科荣,等.固结磨料垫高效研磨氟化钙晶体研究[J].金刚石与磨料磨具工程,2019,39(5):67-72.
SHEN G M, GU Q F, WANG K R, et al. Study on high efficient lapping of calcium fluoride crystal with fixed abrasive pad[J]. Diamond & Abrasives Engineering, 2019, 39(5): 67-72(in Chinese).
[12] 王建彬,马睿,江本赤,等.固结磨料研磨单晶蓝宝石亚表面损伤的预测[J].表面技术,2020,49(6):345-351.
WANG J B, MA R, JIANG B C, et al. Prediction of subsurface damage for fixed abrasive lapping single crystal sapphire[J]. Surface Technology, 2020, 49(6): 345-351(in Chinese).
[13] HO J K, HUANG C Y, TSAI M Y, et al. Investigation of polishing pads impregnated with Fe and Al₂O₃ particles for single-crystal silicon carbide wafers[J]. Applied Sciences, 2016, 6(3): 89.
[14] PARK J, JUNG H, YOSHIDA K, et al. Pad surface treatment to control performance of chemical mechanical planarization[J]. Japanese Journal of Applied Physics, 2008, 47(2): 1028-1033.
[15] LEE D, LEE H. Estimating the mechanical properties of polyurethane-impregnated felt pads[J]. Journal of Mechanical Science and Technology, 2017, 31(12): 5705-5710.
[16] SATAKE U, ENOMOTO T, OBAYASHI Y, et al. Reducing edge roll-off during polishing of substrates[J]. Precision Engineering, 2018, 51: 97-102.
[17] 雷阳,周兆忠,吕冰海,等.蓝宝石基片干式化学机械抛光的研究[J].航空精密制造技术,2013,49(1):7-10.
LEI Y, ZHOU Z Z, LV B H, et al. Study on dry CMP of sapphire subtrate[J]. Aviation Precision Manufacturing Technology, 2013, 49(1): 7-10(in Chinese).
[18] 刘文俊,杨炜,郭隐彪.熔融石英玻璃无水环境固结磨粒抛光特性[J].强激光与粒子束,2018,30(8):24-29.
LIU W J, YANG W, GUO Y B. Characteristic of bounded abrasive polishing for fused silica glass in anhydrous environment[J]. High Power Laser and Particle Beams, 2018, 30(8): 24-29(in Chinese).
[19] 陈军,张文娟,马保中,等.机械活化在固相反应中的研究进展[J].有色金属科学与工程,2021,12(1):13-21.
CHEN J, ZHANG W J, MA B Z, et al. Research progress of mechanical activation in solid phase reaction[J]. Nonferrous Metals Science and Engineering, 2021, 12(1): 13-21(in Chinese).
[20] 王莉,付志强,岳文,等.W含量对CrWN涂层在干摩擦和油润滑下的摩擦学性能影响[J].稀有金属材料与工程,2019,48(7):2371-2378.
WANG L, Fu Z Q, Yue W, et al. Effect of W content on tribological performance of CrWN coating under dry friction and oil lubrication conditions[J]. Rare Metal Materials and Engineering, 2019, 48(7): 2371-2378(in Chinese).
[21] 郭永明,李绪强,王海军,等.超音速等离子喷涂NiCr-Cr₃C₂/Mo复合涂层的高温摩擦磨损性能[J].中国表面工程,2012,25(5):31-36.
GUO Y M, LI X Q, WANG H J, et al. Tribological behavior of supersonic plasma spraying NiCr-Cr₃C₂/Mo composited coatings at high temperature[J]. China Surface Engineering, 2012, 25(5): 31-36(in Chinese).
[22] 李军,张羽驰,明舜,等.固结磨料球对氟化钙晶体摩擦磨损性能的影响[J].表面技术,2019,48(12):196-203.
LI J, ZHANG Y C, MING S, et al. Effect of fixed abrasive ball on friction and wear properties of CaF₂ crystal[J]. Surface Technology, 2019, 48(12): 196-203(in Chinese).
[23] 杨萍,张晨贵,梁莹林,等.SPDT加工对KDP晶体表面温度及应力的影响[J].人工晶体学报,2016,45(4):896-900.
YANG P, ZHANG C G, LIANG Y L, et al. Effect of the SPDT on surface temperature and stress of KDP crystal[J]. Journal of Synthetic Crystals, 2016, 45(4): 896-900(in Chinese).
[24] SCHOLZ R, FROST R L, FROTA L, et al. SEM, EDX and vibrational spectroscopy of the phosphate mineral vauxite from Llallagua, Bolívia[J]. Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy, 2015, 151: 149-155.
[25] FROST R L, PALMER S J, XI Y F. A Raman spectroscopic study of the mono-hydrogen phosphate mineral dorfmanite Na₂(PO₃OH)·2H₂O and in comparison with brushite[J]. Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy, 2011, 82(1): 132-136.
[26] FROST R L, XI Y F, SCHOLZ R, et al. Vibrational spectroscopic characterization of the phosphate mineral series eosphorite-childrenite-(Mn, Fe)Al(PO₄)(OH)₂·(H₂O)[J]. Vibrational Spectroscopy, 2013, 67: 14-21.