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人工晶体学报 ›› 2024, Vol. 53 ›› Issue (2): 194-209.

• 综合评述 • 上一篇    下一篇

高温高压合成掺杂金刚石研究进展

郝敬林1,2, 邓丽芬2, 王凯悦1, 宋惠2, 江南2, 西村一仁2   

  1. 1.太原科技大学材料科学与工程学院,太原 030024;
    2.中国科学院宁波材料技术与工程研究所,海洋材料及相关技术重点实验室,浙江省海洋材料与防护技术重点实验室,宁波 315201
  • 收稿日期:2023-08-16 出版日期:2024-02-15 发布日期:2024-02-04
  • 通信作者: 邓丽芬,博士,教授级高工。E-mail:denglifen@nimte.ac.cn王凯悦,博士,教授。E-mail:wangkaiyue8@163.com宋 惠,博士,副研究员。E-mail:songhui@nimte.ac.cn
  • 作者简介:郝敬林(1998—),男,江苏省人,硕士研究生。E-mail:haojinglin@nimte.ac.cn
  • 基金资助:
    国家重点研发计划(2022YFB3706602,2021YFB3701801);宁波市重点科技项目(2022Z191);宁波市甬江人才引进计划(2021A-037-C,2021A-108-G);中国科学院青年基金(JCPYJ-22030);宁波市重大科技攻关专项(2021ZDYF020196);中国科学院项目(ZDKYYQ2020001)

Synthesis of Doped Diamond by High-Pressure and High-Temperature: a Review

HAO Jinglin1,2, DENG Lifen2, WANG Kaiyue1, SONG Hui2, JIANG Nan2, KAZUHITO Nishimura2   

  1. 1. School of Materials Science and Engineering, Taiyuan University of Science and Technology, Taiyuan 030024, China;
    2. Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Key Laboratory of Marine Materials and Related Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
  • Received:2023-08-16 Online:2024-02-15 Published:2024-02-04

摘要: 金刚石具有超高热导率、宽禁带等优点,通过掺杂引入电子和空穴等缺陷,提升载流子浓度,可以使金刚石具有适合半导体应用的电导率,被称为第三代终极宽禁带半导体材料。本文首先介绍了金刚石单晶的高温高压合成方法,接着系统综述了基于高温高压法的金刚石掺杂研究现状和发展,然后分析了N、B、P和S等单元素掺杂及多元素共掺杂对金刚石晶体生长和电学性能的影响,并且对第一性原理计算研究金刚石掺杂进行了分析总结。高温高压退火可以有效改变金刚石中掺杂元素与空位等缺陷组合和分布状态,本文明晰了金刚石中含氮色心形成的原因及高温高压退火对色心的调控机制。最后对金刚石掺杂以及掺杂后金刚石的光学性能和电学性能研究前景进行了展望,指出可进一步探索多元素共掺杂的理论与实验方法,对提升掺杂金刚石性能具有重要意义。

关键词: 金刚石, 高温高压, 掺杂, 含氮色心, 退火, 第一性原理计算

Abstract: Diamond possesses an ultra-high thermal conductivity and a wide band-gap. Its electrical resistance could be adjusted for the semiconductor application by increasing the electron and vacancy content introduced by doping different elements. Therefore, diamond is thought to be the final wide band-gap semiconductor materials. This paper firstly introduces the synthesis of diamond by high-pressure and high-temperature (HPHT) method, and then systematically reviews the current status and developments of diamond doping by HPHT. The effects of single-element doping, such as N, B, P, and S, as well as multi-elements co-doping in the diamond crystal growth and its electrical properties are analyzed. In additional, this paper summaries the study diamond doping using first-principle calculation. HPHT annealing could effectively change the combinations of doped elements and the associated vacancies and their distribution. This paper reviews the adjustment of nitrogen-related color centers in diamond by HPHT annealing, elucidating the formation mechanisms of various nitrogen-related color centers. Finally, This paper prospects the potential optical and electrical properties of doped diamonds, highlighting the importance of theoretical calculations and experimental methods for multi-element co-doping investigation to enhance the performance of doped diamonds.

Key words: diamond, HPHT, doping, nitrogen-vacancy center, annealing, first-principle calculation

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