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人工晶体学报 ›› 2000, Vol. 29 ›› Issue (3): 300-304.

• • 上一篇    

微波等离子化学气相沉积金刚石膜涂层氮化硅刀具

周健;袁润章;余卫华;汪建华;刘桂珍   

  1. 武汉工业大学材料复合新技术国家重点实验室,武汉430070
  • 出版日期:2000-03-15 发布日期:2021-01-20
  • 基金资助:
    湖北省自然科学基金(99J070);国家重点实验室基金(99-7)

Deposition of Diamond Film on Silicon Nitride Tools by MPCVD

ZHOU Jian;YUAN Run-zhang;YU Wei-hua;WANG Jian-hua;LIU Gui-zhen   

  • Online:2000-03-15 Published:2021-01-20

摘要: 金刚石的成核和生长影响金刚石膜的质量.本文用自制的一种新型的不锈钢谐振腔型微波等离子CVD设备,等离子直径为76mm,均匀的温度分布使得金刚石膜均匀生长,在不同工艺条件下研究Si3N4陶瓷刀具上金刚石涂层的成核质量,用SEM,Raman检测和分析研究了在Si3N4刀具上高速高质量生长金刚石膜涂层的制备工艺,并检测了涂层刀具的切削性能,切削试验表明,在切削18wt;Si-Al合金时,金刚石涂层刀具比未涂层刀具的使用寿命增多10倍以上.

关键词: 金刚石涂层刀具;微波等离子化学气相沉积;干切;氮化硅

Abstract: Diamond film's nucleation and growth affects the quality of diamond film. This paper researched the nucleation quality of diamond coating on silicon nitride ceramic tools in different technology conditions in a new model stainless steel resonant cavity type microwave plasma CVD equipment which was made by our lab. The plasma ball's diameter is about 76 mm and homogeneous temperature distribution can realize homogeneous growth of diamond film.We examined and analyzed with scanning electron microscopy (SEM), laser Raman spectrometer (Raman) and researched a preparation technology of diamond coating on silicon nitride ceramic tool in high speed growth and high quality.And the cutting performance of the coating tools in the technology conditions was tested. The results showed that average applied lifetime of coating tools improved over 10 times to that of silicon nitride ceramic tools in cutting 18wt; Si-Al alloy.

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