关键词: ZnO;纳米阵列;籽晶辅助化学水浴沉积法;扫描电子显微镜;X射线衍射

Abstract: ZnO nanorod arrays were prepared by seed-assisted chemical bath deposition, in which the c-axis oriented ZnO films prepared by magnetron sputtering were used as the seed layers. By means of scanning electron microscopy (SEM) and X-ray diffraction (XRD), we investigated the effects of deposition temperature of ZnO seed layer, chemical bath temperature and initial concentration of Zn source in precursor solution on the growth of ZnO nanorod arrays. As a result, the appropriate conditions for the growth of well crystallized ZnO nanoraod arrays which were nearly perpendicular to the substrate were defined.

Key words: ZnO nanorod arrays were prepared by seed-assisted chemical bath deposition, in which the c-axis oriented ZnO films prepared by magnetron sputtering were used as the seed layers. By means of scanning electron microscopy (SEM) and X-ray diffraction (XRD), we investigated the effects of deposition temperature of ZnO seed layer, chemical bath temperature and initial concentration of Zn source in precursor solution on the growth of ZnO nanorod arrays. As a result, the appropriate conditions for the growth of well crystallized ZnO nanoraod arrays which were nearly perpendicular to the substrate were defined.