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人工晶体学报 ›› 2021, Vol. 50 ›› Issue (9): 1681-1687.

• 研究论文 • 上一篇    下一篇

衬底温度对氧化锌薄膜微结构及光学性能的影响

陈星辉, 唐颖慧, 王加强, 柴晗阳, 魏新琪, 陈光伟   

  1. 湖南工业大学理学院,株洲 412007
  • 收稿日期:2021-05-17 出版日期:2021-09-15 发布日期:2021-10-15
  • 通讯作者: 陈光伟,副教授。E-mail:994941804@qq.com
  • 作者简介:陈星辉(1966—),女,湖南省人,副教授。E-mail:442090113@qq.com
  • 基金资助:
    湖南省大学生创新创业训练计划项目(湘教通[2020]191-3062);湖南省教育厅普通高校教学改革研究基金(湘教通[2019]291-579)

Effect of Substrate Temperature on Microstructure and Optical Properties of ZnO Thin Films

CHEN Xinghui, TANG Yinghui, WANG Jiaqiang, CHAI Hanyang, WEI Xinqi, CHEN Guangwei   

  1. College of Science, Hunan University of Technology, Zhuzhou 412007, China
  • Received:2021-05-17 Online:2021-09-15 Published:2021-10-15

摘要: 衬底温度是磁控溅射法制备氧化锌薄膜中一个非常重要的工艺指标,探索衬底温度对氧化锌薄膜微结构及光学性能的影响对制备环保型高质量氧化锌紫外屏蔽材料具有重要意义。以质量分数99.99%的氧化锌陶瓷靶为溅射源,利用射频磁控溅射技术在石英衬底上沉积了氧化锌紫外屏蔽薄膜,通过X射线衍射仪、薄膜测厚仪、紫外-可见分光光度计、荧光分光光度计进行测试和表征,研究了不同衬底温度对ZnO薄膜微结构及光学性能的影响。实验结果表明:制备所得薄膜均为六角纤锌矿结构,具有沿(002)晶面择优取向生长的特点,其晶格常数、晶粒尺寸、透过率、光学能隙、可见荧光、结晶质量等都与衬底温度密切相关,当衬底温度为250 ℃,溅射功率160 W,氩气压强0.5 Pa,氩气流速8.3 mL/min,沉积时间60 min时,所得氧化锌薄膜样品取向性最好,晶粒尺寸最大,薄膜结构致密,具有良好的光学性能和结晶质量。

关键词: ZnO薄膜, 磁控溅射, 衬底温度, 光学性能, 择优取向, 结晶质量

Abstract: Substrate temperature is a very important process index in the preparation of zinc oxide thin films by magnetron sputtering. Exploring the effect of substrate temperature on the microstructure and optical properties of zinc oxide thin films is of great significance for the preparation of environmental protection high quality zinc oxide ultraviolet shielding materials. A zinc oxide ceramic target with a mass fraction of 99.99% was served as a sputtering source, and a zinc oxide ultraviolet shielding film was deposited on a quartz substrate by radio frequency magnetron sputtering technology. And the effects of different substrate temperatures on the microstructure and optical properties of ZnO films were characterized and studied by X-ray diffractometer, film thickness gauge, ultraviolet-visible spectrophotometer, and fluorescence spectrophotometer instruments. The experimental results show that the as-prepared films are all hexagonal wurtzite structures, which exhibit the features of preferential growth along the (002) crystal plane, and their lattice constant, grain size, transmittance, optical energy gap, visible fluorescence, and crystal quality are closely related to the substrate temperature. When the experimental conditions satisfy that the substrate temperature is 250 ℃, the sputtering power is 160 W, the argon pressure is 0.5 Pa, the argon flow rate is 8.3 mL/min, and the deposition time is 60 min, the as-prepared zinc oxide film sample exhibits the best orientation, the largest crystal grain size, and a dense film structure, as well as good optical properties and crystal quality.

Key words: ZnO thin film, magnetron sputtering, substrate temperature, optical property, preferred orientation, crystal quality

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