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人工晶体学报 ›› 2022, Vol. 51 ›› Issue (12): 2131-2136.

• 研究快报 • 上一篇    下一篇

8英寸导电型4H-SiC单晶衬底制备与表征

娄艳芳, 巩拓谌, 张文, 郭钰, 彭同华, 杨建, 刘春俊   

  1. 北京天科合达半导体股份有限公司,北京 102600
  • 收稿日期:2022-12-05 出版日期:2022-12-15 发布日期:2023-01-09
  • 通讯作者: 刘春俊,博士,研究员。E-mail:cjliu@tankeblue.com
  • 作者简介:娄艳芳(1982—),女,北京市人,博士,高级工程师。E-mail:louyanfang@tankeblue.com
  • 基金资助:
    国家重点研发计划(2021YFB3601100)

Fabrication and Characterizations of 8-Inch n Type 4H-SiC Single Crystal Substrate

LOU Yanfang, GONG Tuochen, ZHANG Wen, GUO Yu, PENG Tonghua, YANG Jian, LIU Chunjun   

  1. Beijing Tankeblue Semiconductor Co., Ltd., Beijing 102600, China
  • Received:2022-12-05 Online:2022-12-15 Published:2023-01-09

摘要: 使用物理气相传输法(PVT)通过扩径技术制备出直径为209 mm的4H-SiC单晶,并通过多线切割、研磨和抛光等一系列加工工艺制备出标准8英寸SiC单晶衬底。使用拉曼光谱仪、高分辨X射线衍射仪、光学显微镜、电阻仪、偏光应力仪、面型检测仪、位错检测仪等设备,对8英寸衬底的晶型、结晶质量、微管、电阻率、应力、面型、位错等进行了详细表征。拉曼光谱表明8英寸SiC衬底100%比例面积为单一4H晶型;衬底(004)面的5点X射线摇摆曲线半峰全宽分布在10.44″~11.52″;平均微管密度为0.04 cm-2;平均电阻率为0.020 3 Ω·cm。使用偏光应力仪对8英寸SiC衬底内部应力进行检测表明整片应力分布均匀,且未发现应力集中的区域;翘曲度(Warp)为17.318 μm,弯曲度(Bow)为-3.773 μm。全自动位错密度检测仪对高温熔融KOH刻蚀后的8英寸衬底进行全片扫描,平均总位错密度为3 293 cm-2,其中螺型位错(TSD)密度为81 cm-2,刃型位错(TED)密度为3 074 cm-2,基平面位错(BPD)密度为138 cm-2。结果表明8英寸导电型4H-SiC衬底质量优良,同比行业标准达到行业先进水平。

关键词: 8英寸SiC单晶衬底, 物理气相传输法, X射线摇摆曲线, 微管密度, 翘曲度和弯曲度, 位错密度

Abstract: A SiC single crystal boule with a diameter of 209 mm was grown by physical vapor transport (PVT) method with a diameter expansion technique. Standard 8-inch SiC single crystal substrates were fabricated by using the processes of multi-wire sawing, grinding, polishing and cleaning. Crystal polytype, crystal quality, micropipes, resistivity, stress, wafer shape, dislocation of a randomly selected 8-inch substrate were characterized by Raman spectrometer, high-resolution X-ray diffractometer, optical microscope, resistivity tester, polarization stress meter, wafer flatness tester, and dislocation detector. Raman spectra show that 8-inch substrate consists only 4H polytype. X-ray rocking curves illustrate full-width at half-maximum of the (004) peak between 10.44″ and 11.52″. Micropipe density is 0.04 cm-2 and the average resistivity is 0.020 3 Ω·cm. There is no stress concentration zone in the substrate with an evenly distributed stress. Warp and bow are 17.318 μm and -3.773 μm, respectively. The average dislocation density is 3 293 cm-2 by scanning the full area of the molten KOH etched 8-inch substrate, among which the density of threading screw dislocation(TSD), threading edge dislocation(TED) and basal plane dislocation(BPD) are 81 cm-2, 3 074 cm-2 and 138 cm-2, respectively. All results indicate the high quality of the 8-inch n type 4H-SiC substrate, which reaches world-class levels according to the comparsion with the industry standards.

Key words: 8-inch SiC single crystal substrate, physical vapor transport mehtod, X-ray rocking curve, micropipe density, warp and bow, dislocation density

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