[1] FELDMANN F, BIVOUR M, REICHEL C, et al. Passivated rear contacts for high-efficiency n-type Si solar cells providing high interface passivation quality and excellent transport characteristics[J]. Solar Energy Materials and Solar Cells, 2014, 120: 270-274. [2] RICHTER A, HERMLE M, GLUNZ S W. Reassessment of the limiting efficiency for crystalline silicon solar cells[J]. IEEE Journal of Photovoltaics, 2013, 3(4): 1184-1191. [3] SACHS E, PRUEGER G, GUERRIERI R. An equipment model for polysilicon LPCVD[J]. IEEE Transactions on Semiconductor Manufacturing, 1992, 5(1): 3-13. [4] NANDAKUMAR N, RODRIGUEZ J, KLUGE T, et al. Approaching 23% with large-area monoPoly cells using screen-printed and fired rear passivating contacts fabricated by inline PECVD[J]. Progress in Photovoltaics: Research and Applications, 2018: 3097. [5] DAVID L, HÜBNER S, MIN B, et al. Fired-only passivating poly-Si on oxide contacts with DC-sputtered in-situ phosphorous-doped silicon layers [C]. 37th European Photovoltaic Solar Energy Conference and Exhibition, 2020. [6] 王杨阳.TOPCon生产用LPCVD尾排设计[J].产业创新研究,2021(18):122-124. WANG Y Y. LPCVD tail row design for TOPCon production[J]. Industrial Innovation, 2021(18): 122-124(in Chinese). [7] YAN D, CUEVAS A, BULLOCK J, et al. Phosphorus-diffused polysilicon contacts for solar cells[J]. Solar Energy Materials and Solar Cells, 2015, 142: 75-82. [8] 周良德,林安中,王学建.晶体硅太阳电池钝化工艺的研究[J].太阳能学报,1999,20(1):74-77. ZHOU L D, LIN A Z, WANG X J. Passivation processes of crystalline silicon solar cell[J]. Acta Energiae Solaris Sinica, 1999, 20(1): 74-77(in Chinese). [9] 陈 伟,贾 锐,张希清,等.晶体硅太阳电池表面钝化技术[J].微纳电子技术,2011,48(2):118-127. CHEN W, JIA R, ZHANG X Q, et al. Surface passivation for crystalline silicon solar cells[J]. Micronanoelectronic Technology, 2011, 48(2): 118-127(in Chinese). [10] BAYERL P, FOLCHERT N, BAYER J, et al. Contacting a single nanometer-sized pinhole in the interfacial oxide of a poly-silicon on oxide (POLO) solar cell junction[J]. Progress in Photovoltaics: Research and Applications, 2021, 29(8): 936-942. [11] 宋登元,郑小强.高效率晶体硅太阳电池研究及产业化进展[J].半导体技术,2013,38(11):801-806+811. SONG D Y, ZHENG X Q. Progress in R & D and mass production of high efficiency crystalline silicon solar cells[J]. Semiconductor Technology, 2013, 38(11): 801-806+811(in Chinese). [12] 范子雨,索开南.LPCVD法淀积SiO2薄膜的影响因素分析[J].电子工业专用设备,2019,48(6):9-12. FAN Z Y, SUO K N. Analysis of influencing factors of SiO2 thin films deposited by LPCVD method[J]. Equipment for Electronic Products Manufacturing, 2019, 48(6): 9-12(in Chinese). |