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Journal of Synthetic Crystals ›› 2025, Vol. 54 ›› Issue (3): 420-425.DOI: 10.16553/j.cnki.issn1000-985x.2024.0300

• Thin Film Epitaxy • Previous Articles     Next Articles

ε-Ga2O3 Growth on c-Plane Sapphire Substrate with Metal-Organic Chemical Vapor Deposition

WANG Ziming, ZHANG Yachao, FENG Qian, LIU Shiteng, LIU Yuhong, WANG Yao, WANG Long, ZHANG Jincheng, HAO Yue   

  1. Division of Integrated Circuits, Xidian University, Xi'an 710000, China
  • Received:2024-11-28 Online:2025-03-15 Published:2025-04-03

Abstract: In this paper, the growths of ε-Ga2O3 thin films on c-plane sapphire substrate by metal-organic chemical vapor deposition (MOCVD) via single-step and two-step growth methods were studied respectively. High-resolution X-ray single crystal diffraction was used to analyze the phase composition of Ga2O3 along the c-axis direction of the sapphire. In the single-step method, the thin film grows directly on the sapphire substrate. The β-Ga2O3 (402) peak can be observed at growth temperatures ranging from 360 ℃ to 425 ℃, while the ε-Ga2O3 (004) peak can also be detected at 370~410 ℃. Samples grown at 380 and 390 ℃ exhibit stronger ε-Ga2O3 (004) peaks with lower full width at half maximum (FWHM) and a surface roughness. The two-step growth method involves using an ε-Ga2O3 thin film grown at 380 ℃ as a buffer layer, followed by continuing the growth of ε-Ga2O3 thin films at 400~430 ℃. It is observed that the intensity of the ε-Ga2O3 (004) peak is higher than that of the single-step growth method, with even lower FWHM values. The rocking curve FWHM of the (004) peak of the film reaches 0.49° at continuing growth temperature of 430 ℃. Further adjustment of the pressure in the single-step growth method confirms that the buffer layer effectively promotes the growth of ε-Ga2O3 along the c-axis.

Key words: ε-Ga2O3, metal-organic chemical vapor deposition, sapphire substrate, crystal growth, wide-band-gap semiconductor, X-ray diffraction, atomic force microscope

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