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JOURNAL OF SYNTHETIC CRYSTALS ›› 2004, Vol. 33 ›› Issue (4): 667-669.

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Photoresponse of TiO2 Thin Films Deposited by DC Reactive Magnetron Sputtering

  

  • Online:2004-08-15 Published:2021-01-20

Abstract: TiO2 thin films were prepared by DC reactive magnetron sputtering on ITO surface which deposited on glass substrates. The structure of TiO2 thin films was studied by Raman spectrum and the absorption spectra. The photoresponses of TiO2 thin films were investigated in virtue of photocurrent. The photoresponse time is less than 100s when photocurrent reaches 96; of the maximum and the photocurrent decays to dark current within 200s.The sensitivity and stability of the photoresponse indicate that it is possible for TiO2 thin films to be a new UV detector material.

Key words: TiO2 thin films were prepared by DC reactive magnetron sputtering on ITO surface which deposited on glass substrates. The structure of TiO2 thin films was studied by Raman spectrum and the absorption spectra. The photoresponses of TiO2 thin films were investigated in virtue of photocurrent. The photoresponse time is less than 100s when photocurrent reaches 96; of the maximum and the photocurrent decays to dark current within 200s.The sensitivity and stability of the photoresponse indicate that it is possible for TiO2 thin films to be a new UV detector material.

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