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JOURNAL OF SYNTHETIC CRYSTALS ›› 2007, Vol. 36 ›› Issue (5): 1148-1154.

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Effect of Pulse Repetition Rate on Film Growth in Pulsed Laser Deposition

GUAN Li;LI Xu;ZHANG Duan-ming;ZHANG Wei   

  • Online:2007-10-15 Published:2021-01-20

Abstract: Pulse repetition rate plays an important role in pulsed laser deposition (PLD) technique,which has been shown to have an influence on final material properties. Using kinetic Monte Carlo method, we simulated the early stage of film growth with varying pulse repetition rate in pulsed laser deposition process. The simulation results display that at a low pulse repetition rate increase, there is such a longer pulse interval that islands are given more time to ripen. As a result, the total of island density reduces and film aggregation tends to compact shape. Island density will increase with pulse repetition rate increase, and islands may be in dispersed or dendritic mode. Duty cycle, that is,deposition time also can effect on islands aggregation to a certain extent. The obtained results have been compared with some experimental data.

Key words: Pulse repetition rate plays an important role in pulsed laser deposition (PLD) technique,which has been shown to have an influence on final material properties. Using kinetic Monte Carlo method, we simulated the early stage of film growth with varying pulse repetition rate in pulsed laser deposition process. The simulation results display that at a low pulse repetition rate increase, there is such a longer pulse interval that islands are given more time to ripen. As a result, the total of island density reduces and film aggregation tends to compact shape. Island density will increase with pulse repetition rate increase, and islands may be in dispersed or dendritic mode. Duty cycle, that is,deposition time also can effect on islands aggregation to a certain extent. The obtained results have been compared with some experimental data.

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