JOURNAL OF SYNTHETIC CRYSTALS ›› 2010, Vol. 39 ›› Issue (2): 494-499.

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Numerical Simulation of the Chemical Vapor Deposition of Polycrystalline Silicon in a Trichlorosilane and Hydrogen System

ZHANG Pan;WANG Wei-wen;DONG Hai-hong;WU Yu-lei;CHEN Guang-hui;LI Jian-long   

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