Abstract: ZnO-0.25mol; Vanadium (ZnO∶V) thin films were deposited on glass substrate by RF magnetron sputtering.The type of defects in ZnO∶V thin films under different O2/(O2+Ar) ratios (0;-87.5;) was investigated.The deposited ZnO∶V thin films have wurtzite structure and show c-axis preferred orientation.V4+ and V5+ ions coexist in the films.The defect in ZnO∶V thin films is the complex of VO and Zni.And the ratio of VO to Zni changed with the O2/(O2+Ar) ratio.

Key words: ZnO-0.25mol; Vanadium (ZnO∶V) thin films were deposited on glass substrate by RF magnetron sputtering.The type of defects in ZnO∶V thin films under different O2/(O2+Ar) ratios (0;-87.5;) was investigated.The deposited ZnO∶V thin films have wurtzite structure and show c-axis preferred orientation.V4+ and V5+ ions coexist in the films.The defect in ZnO∶V thin films is the complex of VO and Zni.And the ratio of VO to Zni changed with the O2/(O2+Ar) ratio.