[1] PANKOVE J I.GaN: from fundamentals to applications[J]. Materials Science and Engineering: B, 1999, 61/62: 305-309. [2] DUPUIS R D.Epitaxial growth ofⅢ-V nitride semiconductors by metalorganic chemical vapor deposition[J]. Journal of Crystal Growth, 1997, 178(1/2): 56-73. [3] CAVALLOTTI C, DE MOSCATELLI D, MASI M, et al.Accelerated decomposition of gas phase metal organic molecules determined by radical reactions[J]. Journal of Crystal Growth, 2004, 266(1/2/3): 363-370. [4] JACKO M G, PRICE S J W. The pyrolysis of trimethyl gallium[J]. Canadian Journal of Chemistry, 1963, 41(6): 1560-1567. [5] MOSCATELLI D, CAVALLOTTI C.Theoretical investigation of the gas-phase kinetics active during the GaN MOVPE[J]. The Journal of Physical Chemistry A, 2007, 111(21): 4620-4631. [6] CHEN Q, DAPKUS P D.On the thermal decomposition of trimethylgallium—a molecular beam sampling mass spectroscopy study[J]. Journal of the Electrochemical Society, 1991, 138(9): 2821-2826. [7] LARSEN C A, BUCHAN N I, STRINGFELLOW G B.Reaction mechanisms in the organometallic vapor phase epitaxial growth of GaAs[J].Applied Physics Letters, 1988, 52(6): 480-482. [8] CREIGHTON J R, WANG G T, BREILAND W G, et al.Nature of the parasitic chemistry during AlGaInN OMVPE[J]. Journal of Crystal Growth, 2004, 261(2/3): 204-213. [9] 张红,左然.GaN-MOVPE生长的气相反应中自由基的作用[J].中国科学:技术科学,2019,49(8):939-946. ZHANG H, ZUO R.Effect of radicals on gas phase reactions inGaN MOVPE process[J]. Scientia Sinica (Technologica), 2019, 49(8): 939-946(in Chinese). [10] PARIKH R P, ADOMAITIS R A.An overview of gallium nitride growth chemistry and its effect on reactor design: application to a planetary radial-flow CVD system[J]. Journal of Crystal Growth,2006, 286(2): 259-278. [11] SEKIGUCHI K, SHIRAKAWA H, CHOKAWA K, et al. Thermodynamic analysis of trimethylgallium decomposition during GaN metal organic vapor phase epitaxy[J]. Japanese Journal of Applied Physics, 2018, 57(4S): 04FJ03. [12] RAVASIO S, MOMOSE T, FUJII K, et al.Analysis of the gas phase kinetics active duringGaN deposition from NH3 and Ga(CH3)3[J]. The Journal of Physical Chemistry A, 2015, 119(28): 7858-7871. [13] ZUO R, ZHANG H, WANG B L, et al.Quantum chemistry study on the adduct reaction paths as functions of temperature inGaN/AlN MOVPE growth[J]. ECS Journal of Solid State Science and Technology, 2016, 5(12): P667-P673. [14] FRISCH M J, TRUCKS G W, SCHLEGEL H B, et al.Gaussian 09[CP]. Revision D.01. Gaussian, Inc., Wallingford CT, 2009. [15] ZHAO Y, TRUHLAR D G.The M06 suite of density functionals for main group thermochemistry, thermochemical kinetics, noncovalent interactions, excited states, and transition elements: two new functionals and systematic testing of four M06-class functionals and 12 other functionals[J]. Theoretical Chemistry Accounts, 2008, 120(1/2/3): 215-241. [16] EYRING H.The activated complex in chemical reactions[J]. The Journal of Chemical Physics, 1935, 3(2): 107-115. [17] BEAGLEY B, SCHMIDLING D G.An electron-diffraction study of the molecular structure of trimethylgallium[J]. Journal of Molecular Structure, 1974, 21(3): 437-444. [18] PELEKH A, CARR R W.Gas-phase reaction of trimethylgallium and ammonia: experimental determination of the equilibrium constant and ab initio calculations[J]. The Journal of Physical Chemistry A, 2001, 105(19): 4697-4701. [19] ALMOND M J, JENKINS C E, RICE D A, et al.Organometallic precursors to the formation of GaN by MOCVD: structural characterisation of Me3Ga·NH3 by gas-phase electron diffraction[J]. Journal of Organometallic Chemistry, 1992, 439(3): 251-261. [20] TIMOSHKIN A Y, BETTINGER H F, SCHAEFER H F.DFT modeling of chemical vapor deposition of GaN from organogallium precursors. 1. thermodynamics of elimination reactions[J]. The Journal of Physical Chemistry A, 2001, 105(13): 3240-3248. [21] ATKINS P, PANLA J D.Atkins’ physical chemistry[M]. New York: Oxford University Press, 2002. [22] SCHMID R, BASTING D.Gas phase chemistry in gallium nitride CVD: theoretical determination of the Arrhenius parameters for the first Ga-C bond homolysis of trimethylgallium[J]. The Journal of Physical Chemistry A, 2005, 109(11): 2623-2630. [23] SENGUPTA D.Does the ring compound [(CH3)2GaNH2]3form during MOVPE of gallium nitride? investigations via density functional and reaction rate theories[J]. The Journal of Physical Chemistry B, 2003, 107(1): 291-297. [24] ZHANG H, ZUO R, ZHONG TT, et al.Quantum chemistry study on gas reaction mechanism in AlN MOVPE growth[J]. The Journal of Physical Chemistry A, 2020, 124(15): 2961-2971. [25] SENGUPTA D, MAZUMDER S, KUYKENDALL W, et al.Combined ab initio quantum chemistry and computational fluid dynamics calculations for prediction of gallium nitride growth[J]. Journal of Crystal Growth, 2005, 279(3/4): 369-382. |