Effect of Substrate Temperature on Comprehensive Electrochromic Properties of Magnetron Sputtered NiOx Films

Abstract

Abstract: In order to study the effect of the substrate temperature on the electrochromic properties of NiO_x film, DC reaction magnetron sputtering method was used to prepare NiO_x film at different substrate temperatures, i.e, room temperature, 50, 100, 200 and 300 ℃. The properties of the films including structure and morphology, cyclic stability, optical modulation rate, memory effect, response time, and adhesion to the substrate were explored and compared. The results show that the effect of the substrate temperature on the electrochromic properties of NiO_x film is complicated. NiO_x film prepared at 100 ℃ shows low charge capacity density decay rate, good memory effect, fast response speed,high modulation rate and good adhesion to the substrate. This study may have certain reference significance for the design and fabrication of NiO_x-based electrochromic devices.

Key words: electrochromic, NiO_x, response time, memory effect, cyclic stability, adhesion

CLC Number:

TB383.2

CAI Xiaojia, HUANG Jiajian, SUN Dandan, LIANG Jiaying, TANG Xiufeng, ZHANG Jiong. Effect of Substrate Temperature on Comprehensive Electrochromic Properties of Magnetron Sputtered NiO_x Films[J]. JOURNAL OF SYNTHETIC CRYSTALS, 2024, 53(8): 1453-1463.

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Effect of Substrate Temperature on Comprehensive Electrochromic Properties of Magnetron Sputtered NiO_x Films

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