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人工晶体学报 ›› 2000, Vol. 29 ›› Issue (3): 269-274.

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HFCVD法沉积金刚石薄膜中热丝优化方法

宋雪梅;王波;张兴旺;张生俊;陈光华;严辉   

  1. 北京工业大学材料科学与工程学院,北京100022
  • 出版日期:2000-03-15 发布日期:2021-01-20
  • 基金资助:
    北京市自然科学基金(2992002);北京市科技新星计划项目

Optimizing of Hot Filament Parameters on High Quality Diamond Films Deposition by HFCVD

SONG Xue-mei;WANG Bo;ZHANG Xing-wang;ZHANG Sheng-jun;CHEN Guang-hua;YAN Hui   

  • Online:2000-03-15 Published:2021-01-20

摘要: 本文探讨了在HFCVD(hot filament chemical vapor deposition)沉积金刚石薄膜中热丝数量、位置等几何参数对温度场和辐射场的影响.利用系统热传递模型和计算机辅助的数值解方法得到了该方法沉积大面积金刚石薄膜中衬底表面温度分布和热辐射能量密度分布.发现金刚石薄膜的均匀性受热辐射能量密度分布影响较大.进一步给出了沉积面积为100mm×100mm的金刚石薄膜的最佳参数.

关键词: 金刚石薄膜;CVD;热丝

Abstract: A hot filaments and substrate thermal model is used to explain the correlation between the geometry parameters of the hot filaments and the uniform of diamond films. Applying this model, both the irradiance field and the temperature field are calculated for diamond films in large area growth by hot filament assisted chemical vapor deposition (HFCVD). According to the results, the uniform of diamond films is rather determined by the irradiance field than the temperature field, which is in agreement with the experimental data. Moreover, the suitable geometry parameters to deposit diamond films on 100mm×100mm area are given.

Key words: A hot filaments and substrate thermal model is used to explain the correlation between the geometry parameters of the hot filaments and the uniform of diamond films. Applying this model, both the irradiance field and the temperature field are calculated for diamond films in large area growth by hot filament assisted chemical vapor deposition (HFCVD). According to the results, the uniform of diamond films is rather determined by the irradiance field than the temperature field, which is in agreement with the experimental data. Moreover, the suitable geometry parameters to deposit diamond films on 100mm×100mm area are given.

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